Model for current oscillations at the Si/electrolyte contact: Extension to spatial resolution

ECS Transactions

Volumn 16, Issue 3, 2009, Pages 173-180

  Grzanna, J ^a   Notz, T ^b   Lewerenz, H J ^a  

^a HAHN MEITNER INSTITUT   (Germany)

^b ALBERT EINSTEIN INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; FLUORINE COMPOUNDS; LATTICE MISMATCH; SEMICONDUCTOR QUANTUM WELLS; SILICON COMPOUNDS;

CELLULAR AUTOMATE; CURRENT OSCILLATION; ELECTRODE SURFACES; MACROSCOPIC MODEL; MORPHOLOGICAL MODEL; PHOTOCURRENT OSCILLATIONS; SPATIAL RESOLUTION; SPATIO-TEMPORAL RESOLUTION;

ANODIC OXIDATION;

EID: 63849272895     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2982553     Document Type: Conference Paper

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