Chaos and resonance in the model for current oscillations at the Si/electrolyte contact

AIP Conference Proceedings

Volumn 780, Issue , 2005, Pages 635-638

  Grzanna, J ^a   Jungblut, H ^a   Lewerenz, H J ^b  

^a HAHN MEITNER INSTITUT   (Germany)

^b North Carolina State University   (United States)

Author keywords

Cracks; Etching; Oscillation; Pores; Silicon; Silicon Oxide; Stress; Synchronization

Indexed keywords

EID: 33749464617     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2036832     Document Type: Conference Paper

References (6)

1. Lewerenz, H. J., J. Phys. Ghent. B 101, 2421-2425 (1997).
2. Lehmann, V., J. Electrochem. Soc. 143, 1313-1318 (1996).
3. Grzanna, J., Jungblut, H., and Lewerenz, H. J., J. of Electroanal. Chem. 486, 181-189 (2000).
4. Grzanna, J., Jungblut, H., and Lewerenz, H. J., J. of Electroanal. Chem. 486, 190-203 (2000).
5. Pikovsky, A., Rosenblum, M., and Kurths, J., "Synchronization" Cambridge University Press 2001.
6. Da Fonseca, C., Ozanam, F., and Chazalviel, J.-N., Surface Science 365, 1-14 (1996).