Formation of Si nanowire arrays by metal-assisted chemical etching

ECS Transactions

Volumn 16, Issue 3, 2009, Pages 245-252

  Benoit, C ^a   Bastide, S ^a   Levy Clement C ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ETCHING; NANOWIRES; POLYSTYRENES; SILVER COMPOUNDS; SILVER NANOPARTICLES;

AG NANOPARTICLE; ELECTROLESS AG DEPOSITIONS; METAL-ASSISTED CHEMICAL ETCHING; POLYSTYRENE SPHERES; REPLICA MASK; SI NANOWIRE ARRAYS; TOP-DOWN METHODS; TWO-STEP PROCESS;

SILICON;

EID: 63849265497     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2982562     Document Type: Conference Paper

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