A study on the real-time decomposition monitoring of a metal organic precursor for metal organic chemical vapor deposition processes

Measurement Science and Technology

Volumn 20, Issue 2, 2009, Pages

  Yun, Ju Young ^a   Heo, Soo Won ^b   Kang, Sang Woo ^a   Na, Jeong Gil ^c   Park, Young Jae ^a   Shin, Yong Hyeon ^a   Lee, Ji Hoon ^b   Kim, Tae Sung ^c   Moon, Doo Kyung ^b  

^a Korea Research Institute of Standards and Science   (South Korea)

^b Konkuk University   (South Korea)

^c Sungkyunkwan University   (South Korea)

Author keywords

Metal organic chemical vapor deposition; MOCVD

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DECAY (ORGANIC); DECOMPOSITION; DEGRADATION; DEPOSITION; INDUSTRIAL CHEMICALS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; METALS; ORGANIC CHEMICALS; ORGANOMETALLICS; SEMICONDUCTOR DEVICE MANUFACTURE; STRUCTURE (COMPOSITION); ULTRASONIC IMAGING; VAPOR DEPOSITION; VISCOSITY;

A3. METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD); DEGRADATION MECHANISM; FUNDAMENTAL RESEARCH; METAL ORGANIC; METAL ORGANIC PRECURSORS; SEMICONDUCTOR INDUSTRY; TETRAKIS(DIMETHYLAMIDO)TITANIUM; TRIPHENYL PHOSPHINES;

PALLADIUM;

EID: 63849218241     PISSN: 09570233     EISSN: 13616501     Source Type: Journal    
DOI: 10.1088/0957-0233/20/2/025701     Document Type: Article

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