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Volumn 474, Issue 1-2, 2008, Pages 12-15

Thermal analysis and vapour pressure of a new series of tungsten(VI) oxo-alkoxide-β-ketoesterate complex precursors for the chemical vapour deposition of tungsten oxide

(3) Kunte, G V a Shivashankar, S A a Umarji, A M a

a INDIAN INSTITUTE OF SCIENCE (India)

Author keywords

Ketoesterate complexes; Chemical vapour deposition; Langmuir equation; Thermogravimetry; Tungsten oxide; Vapour pressure

Indexed keywords

CHEMICAL ANALYSIS; CHEMICAL VAPOR DEPOSITION; FUNCTION EVALUATION; GRAVIMETRIC ANALYSIS; INFRARED SPECTROSCOPY; NUCLEAR MAGNETIC RESONANCE; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; OXIDE FILMS; OXIDES; PRESSURE; THERMOANALYSIS; THERMOGRAVIMETRIC ANALYSIS; THICK FILMS; TUNGSTEN; VAPOR PRESSURE; VEGETATION;

ALKOXIDE; CHEMICAL VAPOUR DEPOSITION; COMPLEX PRECURSORS; ELSEVIER (CO); FUNCTION OF TIME; INFRARED (IR); LANGMUIR EQUATIONS; NEW SERIES; NMR SPECTROS COPY; TUNGSTEN COMPLEXES; TUNGSTEN OXIDE (WO); TUNGSTEN OXIDE THIN FILMS; VAPOUR PRESSURES;

TUNGSTEN COMPOUNDS;

EID: 48949115317 PISSN: 00406031 EISSN: None Source Type: Journal
DOI: 10.1016/j.tca.2008.04.018 Document Type: Article

Times cited : (9)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.