Composition control and thickness dependence of {100}-oriented epitaxial BiCoO3 - BiFeO3 films grown by metalorganic chemical vapor deposition

Journal of Applied Physics

Volumn 105, Issue 6, 2009, Pages

  Yasui, Shintaro ^a   Nakajima, Mitsumasa ^a   Naganuma, Hiroshi ^b   Okamura, Soichiro ^b   Nishida, Ken ^c   Yamamoto, Takashi ^c   Iijima, Takashi ^d   Azuma, Masaki ^e   Morioka, Hitoshi ^a,f   Saito, Keisuke ^f   Ishikawa, Mutsuo ^a   Yamada, Tomoaki ^a   Funakubo, Hiroshi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

^c NATIONAL DEFENSE ACADEMY   (Japan)

^d NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^e KYOTO UNIVERSITY   (Japan)

^f BRUKER AXS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION CONTROLS; DEPOSITION TEMPERATURES; DEPOSITION TIME; FILM COMPOSITIONS; METAL-ORGANIC CHEMICAL VAPOR DEPOSITIONS; RHOMBOHEDRAL STRUCTURES; SOURCE GAS; THICKNESS DEPENDENCES;

MAGNETIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR BEAM EPITAXY; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING BISMUTH COMPOUNDS; STRONTIUM ALLOYS; VAPORS;

CRYSTAL SYMMETRY;

EID: 63749126024     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3073824     Document Type: Article

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