Towards the use of the conformal-evaporated-film-by-rotation technique in fabricating microelectronic circuits and microsystems

Microelectronics Reliability

Volumn 49, Issue 4, 2009, Pages 460-462

  Martin Palma R J ^a   Pantano, C G ^a   Lakhtakia, A ^b  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b The Pennsylvania State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MEMS; MICROELECTROMECHANICAL DEVICES; NANOSYSTEMS; ROTATION;

CHALCOGENIDE GLASS; COMB RESONATORS; CONFORMAL COATINGS; EXTERNAL SURFACES; LITHOGRAPHIC PROCESS; MICRO-ELECTRO MECHANICAL SYSTEMS; MICROELECTRONIC CIRCUITS; MULTI STEPS;

MICROSYSTEMS;

EID: 63649106838     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2009.01.003     Document Type: Article

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