Growth of porous anodic films on sputtering-deposited aluminium incorporating Al-Hf alloy nanolayers

Electrochimica Acta

Volumn 54, Issue 13, 2009, Pages 3662-3670

  Garcia Vergara, S J ^a   Hashimoto, T ^a   Skeldon, P ^a   Thompson, G E ^a   Habazaki, H ^b  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

^b HOKKAIDO UNIVERSITY   (Japan)

Author keywords

Aluminium; Anodic oxide; Anodizing; Hafnium; Porous films

Indexed keywords

ACIDS; ALUMINA; ALUMINUM; ANODIC OXIDATION; ELECTRODEPOSITION; ELECTROLYTES; IONS; METALLIC FILMS; OXIDE FILMS; PHOSPHORIC ACID; SCANNING ELECTRON MICROSCOPY; SULFURIC ACID; TRANSMISSION ELECTRON MICROSCOPY;

ALUMINIUM; ANODIC ALUMINAS; ANODIC FILMS; ANODIC OXIDE; ANODIZING; ANODIZING VOLTAGES; BARRIER LAYER THICKNESS; BARRIER LAYERS; CELL WALLS; CONSTANT CURRENTS; FILM MATERIALS; ION CURRENTS; ION MIGRATIONS; ION-BEAM ANALYSIS; KEY FACTORS; MIGRATION RATES; NANO-LAYERS; POROUS FILMS; THICK BARRIER LAYERS; U-SHAPED;

HAFNIUM;

EID: 63649091246     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2009.01.044     Document Type: Article

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