Metal and oxygen ion transport during ionic conduction in amorphous anodic oxide films

Journal of the Electrochemical Society

Volumn 146, Issue 10, 1999, Pages 3741-3749

  Wang, Mei Hui ^a   Hebert, Kurt R ^b  

^a Iowa State University   (United States)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ELECTRIC FIELD EFFECTS; IONIC CONDUCTION IN SOLIDS; NIOBIUM; STOICHIOMETRY; TANTALUM; TUNGSTEN COMPOUNDS;

DEFECT CLUSTERS;

ANODIC OXIDATION;

EID: 0033345044     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1392543     Document Type: Article

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