Formation of anodic films on sputtering-deposited Al-Hf alloys

Electrochimica Acta

Volumn 54, Issue 3, 2009, Pages 1070-1075

  Fogazza, M ^a   Santamaria, M ^a   Di Quarto, F ^a   Garcia Vergara, S J ^b   Molchan, I ^b   Skeldon, P ^b   Thompson, G E ^b   Habazaki, H ^c  

^a UNIVERSITY OF PALERMO   (Italy)

^b UNIVERSITY OF MANCHESTER   (United Kingdom)

^c HOKKAIDO UNIVERSITY   (Japan)

Author keywords

Aluminium; Anodic oxidation; Hafnium

Indexed keywords

ALLOYS; ALUMINUM; ALUMINUM SHEET; AMMONIUM COMPOUNDS; AMORPHOUS ALLOYS; ANODIC OXIDATION; BORON; BORON COMPOUNDS; CERIUM ALLOYS; HAFNIUM; HAFNIUM ALLOYS; HAFNIUM COMPOUNDS; IMAGE SEGMENTATION; METALLIC COMPOUNDS; METALLIC FILMS; NANOCRYSTALLINE ALLOYS; NANOCRYSTALLINE MATERIALS;

ALUMINIUM; AMMONIUM PENTABORATE ELECTROLYTES; AMORPHOUS OXIDES; AMORPHOUS STRUCTURES; ANODIC ALUMINAS; ANODIC FILMS; BORON DISTRIBUTIONS; CATION TRANSPORTS; FILM SURFACES; HAFNIUM CONCENTRATIONS; HIGH EFFICIENCIES; MIGRATION RATES; NANOCRYSTALLINE; NON UNIFORMS; THIN LAYERS;

AMORPHOUS FILMS;

EID: 57149098973     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2008.08.052     Document Type: Article

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