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Volumn 124, Issue 3, 2004, Pages 69-74

Fabrication Process for Surface Micromachine with Small Sticking Problem by Use of Image Reversal Resist as Sacrificial Layer

Author keywords

image reversal resist; sticking; surface micromachine

Indexed keywords


EID: 6344269217     PISSN: 13418939     EISSN: 13475525     Source Type: Journal    
DOI: 10.1541/ieejsmas.124.69     Document Type: Article
Times cited : (1)

References (8)
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  • 2
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    • (1993) Jpn. J. Appl. Phys. , vol.32
    • Kobayashi, D.1    Kim, C.-J.2    Fujita, H.3
  • 6
    • 0036614066 scopus 로고    scopus 로고
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    • H. Kawata, J. Tabata, T. Matsunaga, M. Yasuda, and K. Murata: “Lomg Ni Cantilever Fabrication with New Sacrificial Process”, Jpn. J. Appl. Phys., Vol.41, Part 1, No.6B, pp.4327-4331 (2002)
    • (2002) Jpn. J. Appl. Phys. , vol.41 , pp. 4327-4331
    • Kawata, H.1    Tabata, J.2    Matsunaga, T.3    Yasuda, M.4    Murata, K.5
  • 7
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    • Moritz, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.