Long Ni cantilever fabrication with new sacrificial process

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4327-4331

  Kawata, Hiroaki ^a   Tabata, Jinpei ^a   Matsunaga, Takashi ^a   Yasuda, Masaaki ^a   Murata, Kenji ^a  

^a Osaka Metropolitan University   (Japan)

Author keywords

Cantilever; Ni electroplating; Photoresist film; Plasma ashing; Sacrificial layer; Surface micromachine

Indexed keywords

ADHESION; CANTILEVER BEAMS; ELECTRIC POTENTIAL; ELECTROPLATING; MICROMACHINING; NATURAL FREQUENCIES; NICKEL; PHOTORESISTS; SUBSTRATES;

PLASMA ASHING; SACRIFICIAL PROCESS;

MICROELECTROMECHANICAL DEVICES;

EID: 0036614066     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4327     Document Type: Article

References (6)