Nonlithographic SiO2 nanodot arrays via template synthesis approach

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 8 A, 2004, Pages 5657-5659

  Cha, Young Kwan ^a   Seo, David ^a   Yoo, In K ^a   Park, Sangjin ^a   Jeong, Soo Hwan ^a   Chung, Chee Won ^b  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^b Inha University   (South Korea)

Author keywords

Anodic aluminum oxide; Anodization; Ion milling; Self organization; Si nanodot array

Indexed keywords

ALUMINA; ANODIC OXIDATION; COMMINUTION; ELECTROCHEMISTRY; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; SILICON WAFERS; TANTALUM COMPOUNDS;

ANODIC ALUMINUM OXIDE; ION MILLING; SELF-ORGANIZATION; SILICON NANODOT ARRAYS;

SILICA;

EID: 6344265478     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.5657     Document Type: Article

References (10)

1. D. Routkevitch, A. A. Tager, J. Haruyama, D. Almawlawi, M. Moskovits and J. M. Xu: IEEE Trans. Electron Devices 43 (1996) 1646.
2. H. Deckman and J. H. Dunsmuir: Appl. Phys. Lett. 41 (1982) 377.
3. K. Douglas, G. Devaud and N. Clark: Science 257 (1992) 642.
4. H. Masuda, H. Tanaka and N. Baba: Bull. Chem. Soc. Jpn. 66 (1993) 305.
5. S. Shingubara, O. Okino, Y. Sayama, H. Sakaue and T. Takahagi: Jpn. J. Appl. Phys. 36 (1997) 7791.
6. H. Masuda and M. Satoh: Jpn. J. Appl. Phys. 35 (1996) L126.
7. I. Vorobyoya and E. A. Outkina: Thin Solid Films 324 (1998) 1.
8. Y. Kuo: J. Electrochem. Soc. 139 (1992) 62.
9. S. Shingubara, O. Okino, H. Sakaue and T. Takahagi: J. Vac. Sci. Technol. B 19 (2001) 1901.
10. H. Masuda, H. Yamada, M. Satoh, H. Asoh, M. Nakao and T. Tamamura: Appl. Phys. Lett. 71 (1997) 2770.