SCOPUS 정보 검색 플랫폼

Wuji Cailiao Xuebao/Journal of Inorganic Materials

Volumn 24, Issue 2, 2009, Pages 392-396

Effect of deposition temperature on microstructures and properties of MoSi2 coatings prepared by low pressure chemical vapor deposition

(6) Wu, Heng a Li, He Jun a Wang, Yong Jie a Fu, Qian Gang a He, Zi Bo a Wei, Jian Feng a

a NORTHWESTERN POLYTECHNICAL UNIVERSITY (China)

Author keywords

Deposition temperature; LPCVD; Microstructures; MoSi2 coatings; Properties

Indexed keywords

COATINGS; DEPOSITION RATES; DIFFUSION BONDING; HARDNESS; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; MOLYBDENUM; PROCESS CONTROL; SEMICONDUCTING SILICON; THERMAL EFFECTS; VAPORS;

BONDING STRENGTHS; DEPOSITION PROCESS; DEPOSITION TEMPERATURE; LOW-PRESSURE CHEMICAL-VAPOR DEPOSITIONS; LPCVD; MATRIXES; MO SUBSTRATES; MOSI2 COATINGS; PROPERTIES; SOURCE GAS; TEMPERATURE RANGES;

DEPOSITION;

EID: 63349096605 PISSN: 1000324X EISSN: None Source Type: Journal
DOI: 10.3724/SP.J.1077.2009.00392 Document Type: Article

Times cited : (9)

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