Magnetic properties of the integrated (Fe, M)3O4 (M=Mn and Zn) nano-array structures in large area prepared by Nanoimprint lithography with Mo lift-off technique

Solid State Communications

Volumn 149, Issue 17-18, 2009, Pages 729-733

  Yamanaka, Satoru ^a   Suzuki, Naoki ^b   Lee, Bong Kuk ^b   Lee, Hea Yeon ^a,b   Tanaka, Hidekazu ^a,b   Kawai, Tomoji ^a,b  

^a OSAKA UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

A. Oxide nano structures; B. Mo lift off; B. Nanoimprint lithography (NIL); D. Magnetic properties

Indexed keywords

MAGNETIC PROPERTIES; MAGNETISM; MAGNETOMETERS; MANGANESE; MANGANESE COMPOUNDS; METALLIC COMPOUNDS; MOLYBDENUM; NANOSTRUCTURES; STRUCTURAL METALS; STRUCTURAL PROPERTIES; ZINC;

A. OXIDE NANO-STRUCTURES; ARRAY STRUCTURES; B. MO LIFT-OFF; B. NANOIMPRINT LITHOGRAPHY (NIL); CLUSTER GLASS; COERCIVE FIELDS; CONTINUOUS FILMS; D. MAGNETIC PROPERTIES; DOT SIZES; EPITAXIAL METAL OXIDES; HIGHLY INTEGRATED; LIFT-OFF TECHNIQUES; MAGNETIC STATE; NANO DOTS; PROPERTY MEASUREMENTS; SCALABLE SYSTEMS; SIZE DEPENDENCES; SQUID MAGNETOMETERS;

NANOIMPRINT LITHOGRAPHY;

EID: 63149144584     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssc.2009.02.009     Document Type: Article

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