Development of a 1.5D reference comparator for position and straightness metrology on photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Flugge J ^a   Koning R ^a   Weichert, Ch ^a   Hassler Grohne W ^a   Geckeler, R D ^a   Wiegmann, A ^a   Schulz, M ^a   Elster, C ^a   Bosse, H ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

CD metrology; Double patterning; Pattern placement; Registration metrology; Straightness metrology; Vacuum interferometry

Indexed keywords

CD METROLOGY; DOUBLE PATTERNING; PATTERN PLACEMENT; REGISTRATION METROLOGY; STRAIGHTNESS METROLOGY; VACUUM INTERFEROMETRY;

COMPARATORS (OPTICAL); INTERFEROMETERS; PHOTOMASKS; UNCERTAINTY ANALYSIS; VACUUM;

INTERFEROMETRY;

EID: 62649126098     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.801251     Document Type: Conference Paper

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