Requirements of nano-machining repair system for 45 nm node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6607, Issue PART 1, 2007, Pages

  Lee, Sang Hyeon ^a   Kim, Hwa Sung ^a   Shim, Hong Seok ^a   Lee, Su Young ^a   Kim, Geun Bae ^a   Kwon, Hyuk Joo ^a   Woo, Sang Gyun ^a   Cho, Han Ku ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; MACHINE TOOLS; REPAIR; SCANNING ELECTRON MICROSCOPY;

DIAMOND TIP; NANO-MACHINING REPAIR SYSTEM; WEAK STRUCTURE; WEAR EFFECT;

PHOTOMASKS;

EID: 36248942970     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.728951     Document Type: Conference Paper

References (0)