Amorphous silicon waveguides and light modulators for integrated photonics realized by low-temperature plasma-enhanced chemical-vapor deposition

Optics Letters

Volumn 21, Issue 24, 1996, Pages 2002-2004

  Cocorullo, G ^a,c   Della Corte, F G ^a   Rendina, I ^a   Minarini, C ^b   Rubino, A ^b   Terzini, E ^b  

^a CNR   (Italy)

^b ENEA   (Italy)

^c UNIVERSITY OF CALABRIA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; AMORPHOUS SILICON; AMPLITUDE MODULATION; CHEMICAL VAPOR DEPOSITION; DISTRIBUTED FEEDBACK LASERS; FABRY-PEROT INTERFEROMETERS; INTEGRATED OPTICS; LIGHT MODULATORS; PLASMA APPLICATIONS; REFRACTIVE INDEX; THERMAL EFFECTS;

AMORPHOUS SILICON WAVEGUIDES; CONSTANT PHOTOCURRENT METHOD; EFFECTIVE INDEX METHOD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROPAGATION LOSSES; THERMOOPTIC EFFECTS;

WAVEGUIDES;

EID: 0030386998     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.21.002002     Document Type: Article

References (9)

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