Design and fabrication of ultra-small overlapped AWG demultiplexer based on α-Si nanowire waveguides

Electronics Letters

Volumn 42, Issue 7, 2006, Pages 400-402

  Dai, D ^a   Liu, L ^a,b   Wosinski, L ^b,c,d   He, S ^a,b,d  

^a ZHEJIANG UNIVERSITY   (China)

^b JORCEP   (Sweden)

^c ROYAL INSTITUTE OF TECHNOLOGY KTH   (Sweden)

^d ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYED-WAVEGUIDE GRATING (AWG) DEMULTIPLEXER; CHANNEL SPACING; OVERLAPPED FREE PROPAGATION REGIONS; SI NANOWIRE WAVEGUIDES;

ELECTRONIC EQUIPMENT; FABRICATION; INTEGRATED CIRCUIT LAYOUT; NANOSTRUCTURED MATERIALS; PRODUCT DESIGN; SILICON; WAVEGUIDES;

DEMULTIPLEXING;

EID: 33745181053     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20060157     Document Type: Article

References (7)

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