The effect of annealing on the subpicosecond breakdown behavior of hafnia films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7132, Issue , 2008, Pages

  Nguyen, D N ^a   Emmert, L A ^a   Mero, M ^a   Rudolph, W ^a   Patel, D ^b   Krous, E ^b   Menoni, C S ^b  

^a UNIVERSITY OF NEW MEXICO   (United States)

^b Department of Mechanical Engineering   (United States)

Author keywords

Annealing; Dielectric thin films; Laser breakdown; Laser damage

Indexed keywords

ANNEALING PROCESS; AS-GROWN; BAND EDGES; BREAKDOWN BEHAVIORS; COATING PERFORMANCE; DAMAGE BEHAVIORS; DAMAGE MEASUREMENTS; DIELECTRIC THIN FILMS; FEMTO-SECOND PULSE; FILM DEPOSITIONS; HIGH-POWER; LASER BREAKDOWN; LASER-INDUCED BREAKDOWNS; MATERIAL PROPERTIES; MULTIPLE PULSE; PARTIAL RECOVERIES; SINGLE PULSE; SUBPICOSECOND; THEORETICAL MODELS; TIME-SCALE; ULTRAFAST-LASER SYSTEMS;

ANNEALING; DIELECTRIC FILMS; ELECTROMAGNETIC PULSE; FUSED SILICA; HAFNIUM COMPOUNDS; LASER DAMAGE; OPTICAL COATINGS; OPTICAL MATERIALS; SILICA; THIN FILMS; ULTRASHORT PULSES;

LASERS;

EID: 62149128537     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.804452     Document Type: Conference Paper

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