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Applied Physics Letters

Volumn 94, Issue 9, 2009, Pages

Near-infrared photon upconversion devices based on GaNAsSb active layer lattice matched to GaAs

(7) Yang, Y a Shen, W Z a Liu, H C a,b Laframboise, S R b Wicaksono, S c Yoon, S F c Tan, K H c

a SHANGHAI JIAO TONG UNIVERSITY (China)

b NATIONAL RESEARCH COUNCIL CANADA (Canada)

c NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; GALLIUM ALLOYS; INTEGRATED OPTICS; LIGHT EMITTING DIODES; PHOTODETECTORS; SEMICONDUCTING GALLIUM;

ACTIVE LAYERS; APPLIED BIAS; AVALANCHE GAINS; GAAS; GAAS/ALGAAS; INCIDENT LIGHT INTENSITIES; INTEGRATED SYSTEMS; LATTICE-MATCHED; LIGHT EMITTING DIODE LEDS; NEAR INFRA REDS; NEAR-INFRARED PHOTONS; P-I-N PHOTODETECTORS; ROOM TEMPERATURES; UP CONVERSIONS; UP-CONVERSION EFFICIENCIES; UP-CONVERTERS;

INFRARED DEVICES;

EID: 62149117155 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3091402 Document Type: Article

Times cited : (28)

References (19)

1
- 0037480179
- APPLAB 0003-6951 10.1063/1.126078.
- J. S. Sandhu, A. P. Heberle, B. W. Alphenaar, and J. R. A. Cleaver, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.126078 76, 1507 (2000).
- (2000) Appl. Phys. Lett. , vol.76 , pp. 1507
- Sandhu, J.S.¹ Heberle, A.P.² Alphenaar, B.W.³ Cleaver, J.R.A.⁴

2
- 79955989532
- APPLAB 0003-6951 10.1063/1.1495881.
- M. Chikamatsu, Y. Ichino, N. Takada, M. Yoshida, T. Kamata, and K. Yase, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1495881 81, 769 (2002).
- (2002) Appl. Phys. Lett. , vol.81 , pp. 769
- Chikamatsu, M.¹ Ichino, Y.² Takada, N.³ Yoshida, M.⁴ Kamata, T.⁵ Yase, K.⁶

3
- 0038075339
- APPLAB 0003-6951 10.1063/1.1571981.
- K. J. Russell, I. Appelbaum, H. Temkin, C. H. Perry, V. Narayanamurti, M. P. Hanson, and A. C. Gossard, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1571981 82, 2960 (2003).
- (2003) Appl. Phys. Lett. , vol.82 , pp. 2960
- Russell, K.J.¹ Appelbaum, I.² Temkin, H.³ Perry, C.H.⁴ Narayanamurti, V.⁵ Hanson, M.P.⁶ Gossard, A.C.⁷

4
- 33847684666
- APPLAB 0003-6951 10.1063/1.2710003.
- D. Ban, S. Han, Z. H. Lu, T. Oogarah, A. J. SpringThorpe, and H. C. Liu, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2710003 90, 093108 (2007).
- (2007) Appl. Phys. Lett. , vol.90 , pp. 093108
- Ban, D.¹ Han, S.² Lu, Z.H.³ Oogarah, T.⁴ Springthorpe, A.J.⁵ Liu, H.C.⁶

5
- 0037480182
- JAPIAU 0021-8979 10.1063/1.1709748.
- P. W. Kruse, F. C. Pribble, and R. G. Schulze, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1709748 38, 1718 (1967).
- (1967) J. Appl. Phys. , vol.38 , pp. 1718
- Kruse, P.W.¹ Pribble, F.C.² Schulze, R.G.³

6
- 0013604454
- APPLAB 0003-6951 10.1063/1.92833.
- Y. Mita, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.92833 39, 587 (1981).
- (1981) Appl. Phys. Lett. , vol.39 , pp. 587
- Mita, Y.¹

7
- 36449009225
- JAPIAU 0021-8979 10.1063/1.354931.
- Y. Wang and J. Ohwaki, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.354931 74, 1272 (1993).
- (1993) J. Appl. Phys. , vol.74 , pp. 1272
- Wang, Y.¹ Ohwaki, J.²

8
- 0034229837
- ELLEAK 0013-5194 10.1049/el:20000915.
- H. C. Liu, M. Gao, and P. J. Poole, Electron. Lett. ELLEAK 0013-5194 10.1049/el:20000915 36, 1300 (2000).
- (2000) Electron. Lett. , vol.36 , pp. 1300
- Liu, H.C.¹ Gao, M.² Poole, P.J.³

9
- 0039182453
- APPLAB 0003-6951 10.1063/1.125126.
- J. B. H́roux, X. Yang, and W. I. Wang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.125126 75, 2716 (1999).
- (1999) Appl. Phys. Lett. , vol.75 , pp. 2716
- H́roux, J.B.¹ Yang, X.² Wang, W.I.³

10
- 9744222828
- JAPIAU 0021-8979 10.1063/1.1785867.
- D. Ban, H. Luo, H. C. Liu, Z. R. Wasilewski, A. J. SpringThorpe, R. Glew, and M. Buchanan, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1785867 96, 5243 (2004).
- (2004) J. Appl. Phys. , vol.96 , pp. 5243
- Ban, D.¹ Luo, H.² Liu, H.C.³ Wasilewski, Z.R.⁴ Springthorpe, A.J.⁵ Glew, R.⁶ Buchanan, M.⁷

11
- 0035886192
- JAPIAU 0021-8979 10.1063/1.1403684.
- T. Akatsu, A. Plössl, R. Scholz, H. Stenzel, and U. Gösele, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1403684 90, 3856 (2001).
- (2001) J. Appl. Phys. , vol.90 , pp. 3856
- Akatsu, T.¹ Plössl, A.² Scholz, R.³ Stenzel, H.⁴ Gösele, U.⁵

12
- 0030079777
- JAPNDE 0021-4922 10.1143/JJAP.35.1273.
- M. Kondow, K. Uomi, A. Niwa, T. Kitatani, S. Watahiki, and Y. Yazawa, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 10.1143/JJAP.35.1273 35, 1273 (1996).
- (1996) Jpn. J. Appl. Phys., Part 1 , vol.35 , pp. 1273
- Kondow, M.¹ Uomi, K.² Niwa, A.³ Kitatani, T.⁴ Watahiki, S.⁵ Yazawa, Y.⁶

13
- 20844456510
- 0013-5194
- G. Ungaro, G. L. Roux, R. Teissier, and J. C. Harmand, Electron. Lett. 735, 12466 (1999). 0013-5194
- (1999) Electron. Lett. , vol.735 , pp. 12466
- Ungaro, G.¹ Roux, G.L.² Teissier, R.³ Harmand, J.C.⁴

14
- 0000351086
- APPLAB 0003-6951 10.1063/1.1318228.
- J. C. Harmand, G. Ungaro, L. Largeau, and G. L. Roux, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1318228 77, 2482 (2000).
- (2000) Appl. Phys. Lett. , vol.77 , pp. 2482
- Harmand, J.C.¹ Ungaro, G.² Largeau, L.³ Roux, G.L.⁴

15
- 24944516234
- APPLAB 0003-6951 10.1063/1.2048828.
- Q. Han, X. H. Yang, Z. C. Niu, H. Q. Ni, Y. Q. Xu, S. Y. Zhang, Y. Du, L. H. Peng, H. Zhao, C. Z. Tong, R. H. Wu, and Q. M. Wang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2048828 87, 111105 (2005).
- (2005) Appl. Phys. Lett. , vol.87 , pp. 111105
- Han, Q.¹ Yang, X.H.² Niu, Z.C.³ Ni, H.Q.⁴ Xu, Y.Q.⁵ Zhang, S.Y.⁶ Du, Y.⁷ Peng, L.H.⁸ Zhao, H.⁹ Tong, C.Z.¹⁰ Wu, R.H.¹¹ Wang, Q.M.¹²

16
- 34047145920
- JAPIAU 0021-8979 10.1063/1.2709622.
- J. S. Ng, W. M. Soong, M. J. Steer, M. Hopkinson, J. P. R. David, J. Chamings, S. J. Sweeney, and A. R. Adams, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.2709622 101, 064506 (2007).
- (2007) J. Appl. Phys. , vol.101 , pp. 064506
- Ng, J.S.¹ Soong, W.M.² Steer, M.J.³ Hopkinson, M.⁴ David, J.P.R.⁵ Chamings, J.⁶ Sweeney, S.J.⁷ Adams, A.R.⁸

17
- 20844454888
- APPLAB 0003-6951 10.1063/1.1940722.
- H. Luo, J. A. Gupta, and H. C. Liu, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1940722 86, 211121 (2005).
- (2005) Appl. Phys. Lett. , vol.86 , pp. 211121
- Luo, H.¹ Gupta, J.A.² Liu, H.C.³

18
- 44649124262
- OPEXFF 1094-4087 10.1364/OE.16.007720.
- K. H. Tan, S. F. Yoon, W. K. Loke, S. Wicaksono, T. K. Ng, K. L. Lew, A. Stöhr, S. Fedderwitz, M. Weiß, D. Jäger, N. Saadsaoud, E. Dogheche, D. Decoster, and J. Chazelas, Opt. Express OPEXFF 1094-4087 10.1364/OE.16.007720 16, 7720 (2008).
- (2008) Opt. Express , vol.16 , pp. 7720
- Tan, K.H.¹ Yoon, S.F.² Loke, W.K.³ Wicaksono, S.⁴ Ng, T.K.⁵ Lew, K.L.⁶ Stöhr, A.⁷ Fedderwitz, S.⁸ Weiß, M.⁹ Jäger, D.¹⁰ Saadsaoud, N.¹¹ Dogheche, E.¹² Decoster, D.¹³ Chazelas, J.¹⁴

19
- 36449003753
- APPLAB 0003-6951 10.1063/1.109348.
- I. Schnitzer, E. Yablonovitch, C. Caneau, and T. J. Gmitter, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.109348 62, 131 (1993).
- (1993) Appl. Phys. Lett. , vol.62 , pp. 131
- Schnitzer, I.¹ Yablonovitch, E.² Caneau, C.³ Gmitter, T.J.⁴

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