Studies on physical properties and carrier conversion of SnO2:Nd thin films

Turkish Journal of Physics

Volumn 33, Issue 1, 2009, Pages 37-47

  Joseph, Jochan ^a   Mathew, Varghese ^a   Mathew, Jacob ^b   Abraham, K E ^b  

^a ST ALOYSIUS COLLEGE   (India)

^b ST BERCHMANS COLLEGE   (India)

Author keywords

Electrical properties; Optical properties; Thin films; Vapour deposition; X ray diffraction

Indexed keywords

CONDUCTIVE FILMS; DEPOSITION; DIFFRACTION; DOPING (ADDITIVES); ELECTRONIC PROPERTIES; LIGHT TRANSMISSION; NEODYMIUM; OXIDE FILMS; PHOTOELECTRICITY; PROBES; REFRACTIVE INDEX; SUBSTRATES; THIN FILMS; TRANSPORT PROPERTIES; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

AS DOPING; AVERAGE GRAIN SIZES; BAND GAPS; BASE MATERIALS; CARRIER CONVERSIONS; CONCENTRATION OF; DEPOSITION PARAMETERS; DEPOSITION TEMPERATURES; ELECTRICAL PROPERTIES; HALL PROBES; OPTICAL TRANSMISSION SPECTRUM; OPTICAL TRANSMISSIONS; P TYPES; PHOTOCONDUCTIVITY AND PHOTOVOLTAIC; POLY-CRYSTALLINE; PREFERENTIAL ORIENTATIONS; SUBSTRATE TEMPERATURES; THICKNESS OF THE FILMS; TRANSPARENT CONDUCTING OXIDE THIN FILMS; UV-VIS-NIR; VAPOUR DEPOSITION; X-RAY DIFFRACTION STUDIES;

OPTICAL FILMS;

EID: 61849129992     PISSN: 13000101     EISSN: 13036122     Source Type: Journal    
DOI: None     Document Type: Article

References (23)

1. M. Penza, S. Cozzi, M. A. Tagliente, L. Mirenghi, C. Martucci and A. Quirini, Thin Solid Films., 71, (1999), 349.
2. S. Ishibashi, Y. Higuchi, Y. Ota and K. Nakamura, J. Vac. Sci. Technol., A8, (1998), 1403.
3. G. Frank, E. Kaur and H. Kostlin, Solar energy Matter., 8, (1983), 387.
4. S. Colen, Thin Solid Films., 77, (1981), 127.
5. K. Nomura, Y. Ujihira and S. S. Sharma, J. Mater. Sci., 24, (1989), 937.
6. K. S. Shamala, L. C. S Murthy, and K. Narasimha Rao, Bull. Mater. Sci., 27, (2001), 295.
7. K. L. Chopra, S. Major, and D. K. Pandya, Thin Solid Films., 102, (1983), 1.
8. T. J. Coutts, D. L. Young, and X. Li, MRS. Bull., 25, (2000), 58.
9. A. L. Dawar and J. C. Joshi, J. Mater. Sci., 19, (1984), 1.
10. M. M. Bagheri-Mohagheri and M. Shokooh-Saremi, J. Phys. D: Appl. Phys., 37, (2004), 1248.
11. A. J. Freeman, K. R. Poeppelmeirer, T. O. Mason, R. P. H. Chang, and T. J. Marks, MRS Bull., 25, (2000), 45.
12. H. Yanagi, H. Kawazoe, A. Kudo, M. Yasukowa, and H. Honoso, J. Electro ceram., 4, (2000), 427.
13. A. Kudo, H. Yanagi, H. Hosono, and H. Kawasoe, Appl. Phys. Lett., 73, (1998), 220.
14. H. Kawazoe, H. Yanagi, K. Ueda and H. Hosono, MRS Bull., 25, (2000), 28.
15. J. Tate, M. K. Jayaraj, A. D. Draeseke, T. Ulbrich, A .W. Sleight, K. A. Vanaja, R., Nagarajan, J. F Wager and R. L Hoffman. Thin Solid Films., 397, (2002), 119-24.
16. M. K. Jayaraj, A. D. Draeseke, J. Tate, A. W. Sleight, N. Duan, Mater. Res. Soc. Symp. Proc., 666, (2001).
17. J. Joseph, V. Mathew and K. E. Abraham, Cryst.Res. Technol., 41, (2006), 1020.
18. M. M. Bagheri-Mohagheri and M. Shokooh-Saremi, Semi cond. Sci. Tecnol., 19, (2004), 764.
19. X. C. Yang, Mater. Sci. Eng., B 93, (2002), 249.
20. A. D. Yoffe, Adv. Phys., 42, (1993), 173.
21. W. T. Dong, X. S. Wu, D. P. Chen, X. W. Jiang, and C. S. Zhu, J. Chem. Lett., 5, (2004), 496.
22. J. I. Pankove. Optical Processes in Semiconductors, N. Holonyak (Eds.) Solid State Physical Electronics Series, (Prentice Hall, Eagle Wood Cliffs, N. J., USA, 1971).
23. R. Swanepoel, J. Phys. E., 16, (1983), 121.