Low resistivity indium-tin oxide transparent conductive films. II. Effect of sputtering voltage on electrical property of films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 8, Issue 3, 1990, Pages 1403-1406

  Ishibashi, S ^a   Higuchi, Y ^a   Ota, Y ^a   Nakamura, K ^a  

^a ULVACJAPAN Ltd ^*  (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33845434864     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.576890     Document Type: Article

References (5)

1. A. K. Saxena, S. P. Singh, R. Thangaraj, and O. P. Agnihotri, Thin Solid Films 117, 95 (1984).
2. I. Bamberg and C. G. Granqvist, J. Appl. Phys. 60, 11 (1986).
3. P. Nath, R. F. Bunshah, S. M. Basel, and O. M. Staffsud, Thin Solid Films 72, 463 (1980).
4. J. C. C. Fan, F. J. Bachner, and G. H. Foley, Appl. Phys. Lett. 31, 773 (1977).
5. S. Ray, R. Baneijee, N. Basu, A. K. Batabyal, and A. K. Barua, J. Appl. Phys. 54, 3497 (1983).