Double patterning overlay budget for 45 nm technology node single and double mask approach

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2461-2465

  Rigolli, Pierluigi ^a   Turco, Catia ^a   Iessi, Umberto ^a   Capetti, Gianfranco ^a   Canestrari, Paolo ^a   Fradilli, Aldo ^b  

^a STMICROELECTRONICS   (Italy)

^b Canon Italia   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

FLASH MEMORY; IMAGING SYSTEMS; MASKS;

DOUBLE PATTERNING; OVERLAY METROLOGY; PHOTOETCH;

NANOTECHNOLOGY;

EID: 37149001209     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2805246     Document Type: Article

References (4)

1. C. Lim, Proc. SPIE 6154, 100 (2006).
2. C. Noelscher, M. Heller, B. Habets, M. Markert, U. Scheler, and P. Moll, Microelectron. Eng. 83, 730 (2006).
3. M. Dusa, Proc. SPIE 6520, 16 (2007).
4. P. Rigolli, L. Rozzoni, C. Turco, U. Iessi, M. Polli, E. Kassel, P. Izikson, and Y. Avrahamov, Proc. SPIE 6152, 40 (2006).