Characterization of pulsed laser deposited chalcogenide thin layers

Applied Surface Science

Volumn 255, Issue 10, 2009, Pages 5318-5321

  Petkova, T ^a   Popov, C ^b   Hineva, T ^c   Petkov, P ^c   Socol, G ^d   Axente, E ^d   Mihailescu, C N ^d   Mihailescu, I N ^d   Reithmaier, J P ^b  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

^b UNIVERSITY OF KASSEL   (Germany)

^c UNIVERSITY OF CHEMICAL TECHNOLOGY AND METALLURGY   (Bulgaria)

^d NATIONAL INSTITUTE FOR LASER   (Romania)

Author keywords

Chalcogenide thin films; Morphology; Nanostructure; Pulsed laser deposition

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CHALCOGENIDES; EXCIMER LASERS; FILM PREPARATION; IODINE COMPOUNDS; MORPHOLOGY; NANOSTRUCTURES; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; SILVER HALIDES; SUBSTRATES; THIN FILMS; TOPOGRAPHY; X RAY DIFFRACTION;

CHALCOGENIDE MATERIALS; CHALCOGENIDE THIN FILMS; COMPLEMENTARY TECHNIQUES; DIFFRACTION REFLECTIONS; ENERGY DISPERSIVE X-RAY; ROOT MEAN SQUARE ROUGHNESS; SENSING APPLICATIONS; TOPOGRAPHICAL ANALYSIS;

PULSED LASERS;

EID: 61749099892     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.07.194     Document Type: Article

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