Single asperity tribochemical wear of silicon by atomic force microscopy

Journal of Materials Research

Volumn 24, Issue 1, 2009, Pages 173-178

  Katsuki, Futoshi ^a  

^a Sumitomo Metal Industries Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMS; DISSOLUTION; ELECTROLYTES; FRICTION; ORGANIC POLYMERS; PH EFFECTS; POTASSIUM; POTASSIUM HYDROXIDE; SILICA; SILICON; SINGLE CRYSTAL SURFACES; TRIBOLOGY;

AFM; AQUEOUS ELECTROLYTE SOLUTIONS; ATOMIC FORCES; ATOMIC-FORCE MICROSCOPIES; BOND RUPTURES; DIFFUSION OF WATERS; FRICTIONAL FORCES; KINETIC FRICTIONS; KOH SOLUTIONS; LIQUID TEMPERATURES; MICRO WEARS; OXIDIZED SILICONS; PH DEPENDENCES; PH VALUES; PRESSURE DEPENDENCES; REMOVAL MECHANISMS; SI ATOMS; SI-O-SI BRIDGES; SINGLE ASPERITIES; SINGLE CRYSTAL SILICONS; SOLUTION PH; TIP WEARS; TRIBOCHEMICAL WEARS; WEAR MECHANISMS;

SILICON WAFERS;

EID: 61749092172     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2009.0024     Document Type: Article

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