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Volumn 991, Issue , 2007, Pages 93-105

AFM investigations of chemical-mechanical processes on silicon(100) surfaces

Author keywords

[No Author keywords available]

Indexed keywords

BASIC SOLUTION; CHEMICAL EFFECTS; TRIBOCHEMICAL MECHANISM;

EID: 38549132316     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (1)

References (11)
  • 1
    • 18744413294 scopus 로고    scopus 로고
    • Single asperity tribochemical wear of silicon nitride studied by atomic force microscopy
    • W. Maw, F. Stevens, S. C. Langford, and J. T. Dickinson, "Single asperity tribochemical wear of silicon nitride studied by atomic force microscopy," J. Appl. Phys. 92, 5103-5109 (2002).
    • (2002) J. Appl. Phys , vol.92 , pp. 5103-5109
    • Maw, W.1    Stevens, F.2    Langford, S.C.3    Dickinson, J.T.4
  • 2
    • 31644449078 scopus 로고    scopus 로고
    • Tribochemical wear of sodium trisilicate glass at the nanometer size scale
    • F. Stevens, S. C. Langford, and J. T. Dickinson, "Tribochemical wear of sodium trisilicate glass at the nanometer size scale," J. Appl. Phys. 99, 023529 (2006).
    • (2006) J. Appl. Phys , vol.99 , pp. 023529
    • Stevens, F.1    Langford, S.C.2    Dickinson, J.T.3
  • 4
    • 0035139699 scopus 로고    scopus 로고
    • Nanotribology of Si oxide layers on Si by atomic force microsocopy
    • W. C. Moon, T. Yoshinobu, and H. Iwasaki, "Nanotribology of Si oxide layers on Si by atomic force microsocopy," Ultramicroscopy 86, 49-53 (2001).
    • (2001) Ultramicroscopy , vol.86 , pp. 49-53
    • Moon, W.C.1    Yoshinobu, T.2    Iwasaki, H.3
  • 5
    • 0022043722 scopus 로고
    • Ellipsometric study of orientation-dependent etching of silicon in aqueous KOH
    • E. D. Palik, V. M. Bermudez, and O. J. Glembocki, "Ellipsometric study of orientation-dependent etching of silicon in aqueous KOH," J. Electrochem. Soc. 132, 871-884 (1985).
    • (1985) J. Electrochem. Soc , vol.132 , pp. 871-884
    • Palik, E.D.1    Bermudez, V.M.2    Glembocki, O.J.3
  • 6
    • 0025521074 scopus 로고
    • Anisotropic etching of crystalline silicon in alkaline solutions
    • H. Seidel, L. Csepregi, A. Heuberger, and H. Baumgärtel, "Anisotropic etching of crystalline silicon in alkaline solutions," J. Electrochem. Soc. 137, 3612-3626 (1990).
    • (1990) J. Electrochem. Soc , vol.137 , pp. 3612-3626
    • Seidel, H.1    Csepregi, L.2    Heuberger, A.3    Baumgärtel, H.4
  • 7
    • 0020734699 scopus 로고
    • A Raman study of etching silicon in aqueous KOH
    • E. D. Palik, H. G. Gray, and P. B. Klein, "A Raman study of etching silicon in aqueous KOH," J. Electrochem. Soc. 130, 956-959 (1983).
    • (1983) J. Electrochem. Soc , vol.130 , pp. 956-959
    • Palik, E.D.1    Gray, H.G.2    Klein, P.B.3
  • 9
    • 0033732939 scopus 로고    scopus 로고
    • Etching characteristics of Si(100) surfaces in an aqueous NaOH solution
    • K. Sakaino, Y. Kawabata, and S. Adachi, "Etching characteristics of Si(100) surfaces in an aqueous NaOH solution," J. Electrochem. Soc. 147, 1530-1534 (2000).
    • (2000) J. Electrochem. Soc , vol.147 , pp. 1530-1534
    • Sakaino, K.1    Kawabata, Y.2    Adachi, S.3
  • 10
    • 0035125196 scopus 로고    scopus 로고
    • Study of Si(100) surfaces etched in TMAH solution
    • K. Sakaino and S. Adachi, "Study of Si(100) surfaces etched in TMAH solution," Sensors and Actuators A 88, 71-78 (2001).
    • (2001) Sensors and Actuators A , vol.88 , pp. 71-78
    • Sakaino, K.1    Adachi, S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.