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Volumn 150, Issue 2-3, 2002, Pages 257-262
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Study of the initial stages of TiO2 growth on Si wafers by XPS
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Author keywords
Thin films; Titanium oxide; X ray photoelectron spectroscopy
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Indexed keywords
CHEMICAL ANALYSIS;
COMPOSITION;
GROWTH (MATERIALS);
SILICON;
STOICHIOMETRY;
TITANIUM DIOXIDE;
X RAY PHOTOELECTRON SPECTROSCOPY;
ENERGY RESOLUTION;
COATINGS;
INORGANIC COATING;
SILICON;
TITANIUM DIOXIDE;
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EID: 0037084534
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/S0257-8972(01)01541-9 Document Type: Article |
Times cited : (42)
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References (21)
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