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Volumn 150, Issue 2-3, 2002, Pages 257-262

Study of the initial stages of TiO2 growth on Si wafers by XPS

Author keywords

Thin films; Titanium oxide; X ray photoelectron spectroscopy

Indexed keywords

CHEMICAL ANALYSIS; COMPOSITION; GROWTH (MATERIALS); SILICON; STOICHIOMETRY; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0037084534     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01541-9     Document Type: Article
Times cited : (42)

References (21)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.