Magnetolithography: From bottom-up route to high throughput

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Volumn 5, Issue 3, 2009, Pages 316-319

  Bardea, Amos ^a   Naaman, Ron ^a  

^a WEIZMANN INSTITUTE OF SCIENCE   (Israel)

Author keywords

Lithography; Magnetic properties; Nanoparticles; Patterning

Indexed keywords

MAGNETIC FIELDS; MAGNETIC MATERIALS; MAGNETIC PROPERTIES; NANOPARTICLES; SCANNING ELECTRON MICROSCOPY; THROUGHPUT;

APPLIED FIELDS; BOTTOM-UP METHODS; FLUORESCENT MOLECULES; GLASS SUBSTRATES; HIGH THROUGHPUTS; LINE WIDTHS; MAGNETIC NANOPARTICLES; MASS PRODUCTIONS; METAL MASKS; PATTERNED SUBSTRATES; PATTERNING; SCANNING ELECTRON MICROSCOPY IMAGES; SPACE BETWEEN; SPATIAL DISTRIBUTIONS;

SUBSTRATES;

NANOPARTICLE;

ARTICLE; CHEMISTRY; MAGNETISM; PARTICLE SIZE; SCANNING ELECTRON MICROSCOPY;

MAGNETICS; MICROSCOPY, ELECTRON, SCANNING; NANOPARTICLES; PARTICLE SIZE;

EID: 61349173244     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.200801058     Document Type: Article

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