Morphological and optical properties of silicon thin films by PLD

Applied Surface Science

Volumn 255, Issue 10, 2009, Pages 5299-5302

  Ayouchi, R ^a   Schwarz, R ^a   Melo, L V ^a   Ramalho, R ^a   Alves, E ^b   Marques, C P ^b   Santos, L ^a   Almeida, R ^a   Conde, O ^c  

^a INSTITUTO SUPERIOR TÉCNICO   (Portugal)

^b INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

^c UNIVERSITY OF LISBON   (Portugal)

Author keywords

Nano crystalline silicon; Pulsed laser deposition; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; NANOCRYSTALLINE SILICON; NEODYMIUM LASERS; OPTICAL PROPERTIES; PULSED LASER DEPOSITION; PULSED LASERS; SAPPHIRE; SUBSTRATES; SURFACE ROUGHNESS; YTTRIUM ALUMINUM GARNET;

DEPOSITED FILMS; DEPOSITION TEMPERATURES; Q SWITCHED ND:YAG LASER; SAPPHIRE SUBSTRATES; SILICON THIN FILM; SPECTRAL ELLIPSOMETRY; SUBSTRATE TEMPERATURE; TEMPERATURE RANGE;

THIN FILMS;

EID: 61349086649     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.10.056     Document Type: Article

References (9)

1. Bi L., and Feng J.Y. Journal of Luminescence 121 (2006) 95
2. Cheng C., and Wagner S. Thin Solid Films 427 (2003) 56
3. Son J.W., Orlov S.S., Phillips B., and Hesselink L. Journal of Electroceramics 17 (2006) 591
4. Beena D., Lethy K.J., Vinodkumar R., and Mahadevanpillai V.P. Solar Energy Materials and Solar Cells 91 (2007) 1438
5. Coutal C., Azema A., and Roustan J.C. Thin Solid Films 288 (1996) 248
6. Zhang D., Guan L., Li Z., Pan G., Tan X., and Li L. Applied Surface Science 253 (2006) 874
7. Ma Z., Liao X., Kong G., and Chu J. Materials Letters 42 (2000) 367
8. Rajagopalan T., Wang X., Lahlouh B., Ramkumar C., Partha Dutta S., and Gangopadhyay. Journal of Applied Physics 94 (2003) 5252
9. Aspnes D.E., and Studna A.A. Physical Review B 27 (1983) 985