N2O removal in N2 or air by ArF excimer laser photolysis at atmospheric pressure

Journal of Hazardous Materials

Volumn 108, Issue 3, 2004, Pages 189-197

  Tsuji, Masaharu ^a,b   Kumagae, Jun ^a   Tsuji, Takeshi ^a,b   Hamagami, Taro ^a  

^a KYUSHU UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

ArF excimer laser; Gas kinetics; N2O removal; Photochemical process

Indexed keywords

ATMOSPHERIC PRESSURE; CATALYSTS; CHEMICALS REMOVAL (WATER TREATMENT); DECOMPOSITION; EXCIMER LASERS; IRRADIATION; KINETIC THEORY OF GASES; NITROGEN OXIDES; OXYGEN; PHOTOLYSIS;

FORMATION RATIOS; PHOTOCHEMICAL PROCESSES; ROOM TEMPERATURE;

AIR POLLUTION;

ARGON; FLUORINE; NITRIC OXIDE; NITROGEN; NITROGEN DERIVATIVE; NITROUS OXIDE;

GAS; NITROGEN DIOXIDE; PHOTOCHEMICAL TREATMENT; POLLUTANT REMOVAL;

ARTICLE; ATMOSPHERIC PRESSURE; CALCULATION; CATALYSIS; COMPARATIVE STUDY; DECOMPOSITION; DILUTION; EXCIMER LASER; GAS ANALYSIS; KINETICS; PHOTOCHEMISTRY; PHOTOLYSIS; PROCESS MODEL; ROOM TEMPERATURE; TECHNIQUE; AIR; CHEMICAL INDUSTRY; CHEMISTRY; LASER; METHODOLOGY; RADIATION EXPOSURE; TEMPERATURE;

AIR; ARGON; ATMOSPHERIC PRESSURE; CHEMICAL INDUSTRY; FLUORINE; LASERS; NITROGEN; NITROUS OXIDE; PHOTOLYSIS; TEMPERATURE;

EID: 2142701419     PISSN: 03043894     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jhazmat.2004.02.024     Document Type: Article

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