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Journal of Electroceramics

Volumn 22, Issue 1-3, 2009, Pages 319-326

Fine patterning of ceramic thick layer on aerosol deposition by lift-off process using photoresist

(3) Akedo, Jun a Park, Jaehyuk a Tsuda, Hiroki a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

Author keywords

Aerosol deposition; Ceramic thick film; Fine pattern; Lift off process; Photoresist

Indexed keywords

ATMOSPHERIC AEROSOLS; CERAMIC MATERIALS; PHOTORESISTORS; PHOTORESISTS; PIEZOELECTRIC TRANSDUCERS; SURFACE TREATMENT; THICK FILMS;

AEROSOL DEPOSITION; AEROSOL DEPOSITION METHODS; CERAMIC THICK FILM; DEPOSITED LAYERS; FINE PATTERN; LIFT-OFF PROCESS; PATTERNED STRUCTURES; PHOTORESIST LAYERS; PZT; ROOM TEMPERATURES; SI SUBSTRATES; THICK LAYERS;

RESPIRATORY MECHANICS;

EID: 60649105099 PISSN: 13853449 EISSN: 15738663 Source Type: Journal
DOI: 10.1007/s10832-007-9385-y Document Type: Article

Times cited : (19)

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