Application of multiway chemometric techniques for analysis of AC voltammetric data

Electroanalysis

Volumn 21, Issue 3-5, 2009, Pages 580-589

  Jaworski, Aleksander ^a   Wikiel, Hanna ^a   Wikiel, Kazimierz ^a  

^a YesTech Inc   (United States)

Author keywords

AC voltammetry; Chemometrics; Copper electroplating; DTLD; Multiway calibration; N PLS; PARAFAC

Indexed keywords

COPPER; LEAST SQUARES APPROXIMATIONS; SEMICONDUCTOR DEVICE MANUFACTURE;

AC VOLTAMMETRY; CHEMOMETRICES; COPPER ELECTROPLATING; DIRECT TRILINEAR DECOMPOSITION; INVERSE LEAST SQUARES; MULTIWAY CALIBRATION; N-PLS; PARALLEL FACTOR ANALYSIS; TRILINEAR DECOMPOSITION; VOLTAMMETRIC DATA;

VOLTAMMETRY;

EID: 60549091978     PISSN: 10400397     EISSN: 15214109     Source Type: Journal    
DOI: 10.1002/elan.200804453     Document Type: Article

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