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Volumn 94, Issue 6, 2009, Pages

Difference in the nonlinear optical response of epitaxial Si on Ge(100) grown from SiH4 at 500 °c and from Si3 H8 at 350 °c due to segregation of Ge

Author keywords

[No Author keywords available]

Indexed keywords

GERMANIUM; HARMONIC GENERATION; NONLINEAR OPTICS; SEGREGATION (METALLOGRAPHY); SILICON;

EID: 60349107589     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3082092     Document Type: Article
Times cited : (5)

References (10)
  • 2
    • 57149144973 scopus 로고    scopus 로고
    • 0167-5729 10.1016/S0167-5729(99)00007-2.
    • G. Lüpke, Surf. Sci. Rep. 0167-5729 10.1016/S0167-5729(99)00007-2 35, 75 (1999).
    • (1999) Surf. Sci. Rep. , vol.35 , pp. 75
    • Lüpke, G.1
  • 3
    • 0346596676 scopus 로고
    • Prog. Surf. Sci. 0079-6816 10.1016/0079-6816(95)00034-V, ();, 2nd ed. (Springer, New York, 1998), 160.
    • J. F. McGilp, Prog. Surf. Sci. 0079-6816 10.1016/0079-6816(95)00034-V 49, 1 (1995); D. L. Mills, Nonlinear Optics Basic Concepts, 2nd ed. (Springer, New York, 1998), p. 160.
    • (1995) Nonlinear Optics Basic Concepts , vol.49 , pp. 1
    • McGilp, J.F.1    Mills, D.L.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.