Structural Properties of Yttria-Stabilized Zirconia Films Grown on Silicon (001) Using MOCVD

Chemical Vapor Deposition

Volumn 3, Issue 2, 1997, Pages 91-96

  Garcia, Gemma ^b   Casado, Juan ^b   Llibre, Joan ^b   Cifre, Joan ^a   Figueras, Albert ^a   Galí, Salvador ^c   Bassas, Josep ^d  

^a CSIC   (Spain)

^b S ECarburos Met licos   (Spain)

^c UNIVERSITY OF BARCELONA   (Spain)

^d Serveis Cientifico tècnics UB   (Spain)

Author keywords

Lattice parameters; MOCVD; Stability domains; Stress; YSZ

Indexed keywords

CERAMIC MATERIALS; CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; DEFORMATION; DOPING (ADDITIVES); FILM GROWTH; FILM PREPARATION; RESIDUAL STRESSES; SILICON; THIN FILMS; YTTRIUM COMPOUNDS;

CELL DEFORMATION;

ZIRCONIA;

EID: 0031094583     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.19970030207     Document Type: Article

References (9)

1. A. Krauth, H. Mayer, Ber. Dtsch. Keram. Ges. 1995, 42, 61.
2. P. Kountourous, G. Petzow, in Science and Technology of Zirconia V (Ed: S. P. S. Badwal), Technomic, Lancaster, PA 1993, p. 31.
3. M. Morinaga, H. Adachi, M. Tsukuda, J. Phys. Chem. Solids 1983, 44, 301.
4. T. Mitsuhashi, M. Ichihara, U. Tatsuke, J. Am. Ceram. Soc. 1974, 57, 97.
5. R. P. Ingel, D. Lewis III, J. Am. Ceram. Soc. 1986, 69, 325.
6. H. J. Bunge, Texture Analysis in Material Science, Butterworths, London 1982, p. 321.
7. G. Garcia, J. Casado, J. Llibre, M. Doudkowski, J. Santiso, A. Figueras, S. Schamm, D. Dorignac, C. Grigis, M. Aguiló, Proc. Euro-CVD X, Venice 1995 (Ed: G. Battiston), Les Editions de Physique, Les Ulis, France 1995, Vol. 1, C5-439.
8. R. Ingel, D. Lewis III, J. Am. Ceram. Soc. 1988, 71, 265.
9. G. Garcia, J. Casado, J. Llibre, A. Figueras, J. Cryst. Growth 1995, 156, 426.