Processes involved in the formation of silver clusters on silicon surface

Journal of Experimental and Theoretical Physics

Volumn 107, Issue 6, 2008, Pages 1009-1021

  Bhattacharyya, S R ^a   Chini, T K ^a   Datta, D ^a   Hippler, R ^b   Shyjumon, I ^b   Smirnov, B M ^c  

^a SAHA INSTITUTE OF NUCLEAR PHYSICS   (India)

^b UNIVERSITY OF GREIFSWALD   (Germany)

^c JOINT INSTITUTE FOR HIGH TEMPERATURES   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AGGREGATES; ATOMS; BINDING ENERGY; DIFFUSION; ELECTRON MICROSCOPY; MELTING POINT; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SCANNING; SCANNING ELECTRON MICROSCOPY; SILVER; SURFACE DIFFUSION;

CLUSTER AGGREGATES; CLUSTER DEPOSITIONS; CLUSTER SIZES; DC-MAGNETRON SPUTTERING; DIFFUSION-LIMITED AGGREGATIONS; ENERGY DISPERSIVE; HIGH TEMPERATURES; HIGHER TEMPERATURES; POROUS FILMS; QUADRUPOLE; SCANNING ELECTRONS; SEM; SILICON SURFACES; SILICONS (100); SILVER CLUSTERS; SOLID CLUSTERS; SOLID SILVERS; THEORETICAL MODELS; THERMAL-ANNEALING; X-RAY SPECTROMETRIES;

AGGLOMERATION;

EID: 60249093988     PISSN: 10637761     EISSN: None     Source Type: Journal    
DOI: 10.1134/S1063776108120108     Document Type: Article

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