Cluster ion beam profiling of organics by secondary ion mass spectrometry - Does sodium affect the molecular ion intensity at interfaces?

Rapid Communications in Mass Spectrometry

Volumn 22, Issue 24, 2008, Pages 4178-4182

  Green, Felicia M ^a   Gilmore, Ian S ^a   Seah, Martin P ^a  

^a NATIONAL PHYSICAL LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DEPTH PROFILING; DRUG DELIVERY; ION BEAMS; ION BOMBARDMENT; ION IMPLANTATION; ION SOURCES; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SILICON WAFERS; SODIUM; SUBSTRATES;

BEAM PROFILING; CLUSTER ION BEAMS; ION INTENSITIES; ION-BEAM-SPUTTERING; MOLECULAR IONS; ORGANICS; SECONDARY ION-MASS SPECTROMETRY; SECONDARY IONS; SILICON WAFER SUBSTRATES; SPUTTERING YIELDS;

INTERFACES (MATERIALS);

EID: 60149113097     PISSN: 09514198     EISSN: 10970231     Source Type: Journal    
DOI: 10.1002/rcm.3840     Document Type: Article

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