SIMS depth profile analysis of sodium in silicon dioxide

Applied Surface Science

Volumn 255, Issue 4, 2008, Pages 860-862

  Yamamoto, Y ^a   Shimodaira, N ^a  

^a ASAHI GLASS CO LTD   (Japan)

Author keywords

Ion implant; Migration; Q SIMS; SiO 2 matrix; Sodium

Indexed keywords

EXTRACTION; IONS; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SILICA; SILICON OXIDES; SODIUM;

DEPTH-PROFILE ANALYSIS; ELECTRON BEAM VOLTAGE; ION IMPLANT; MEASUREMENT APPARATUS; MIGRATION; OPTIMIZED CONDITIONS; QUADRUPOLE MASS ANALYZERS; SIMS DEPTH PROFILE ANALYSIS;

SODIUM COMPOUNDS;

EID: 56449109283     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.05.069     Document Type: Article

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