SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 475, Issue 1-2 SPEC. ISS., 2005, Pages 271-274

PECVD SiO2 and SiON films dependant on the rf bias power for low-loss silica waveguide

(3) Kim, Y T a Kim, D S a Yoon, D H a

a Sungkyunkwan University (South Korea)

Author keywords

Annealing; Plasma enhanced chemical vapor deposition; Silicon dioxide; Silicon oxynitride

Indexed keywords

ADHESION; ANNEALING; ATOMIC FORCE MICROSCOPY; CHARGED PARTICLES; ELECTRODES; MORPHOLOGY; OPTICAL WAVEGUIDES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; REFRACTIVE INDEX; SILANES; SINGLE MODE FIBERS; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRONEGATIVITY; PLANAR LIGHTWAVE CIRCUITS (PLC); SILICON OXYNITRIDE; SUBSTRATE TEMPERATURE;

SILICA;

EID: 13444302496 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2004.07.044 Document Type: Conference Paper

Times cited : (29)

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