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Proceedings of the International Conference on Ion Implantation Technology

Volumn 22-27-September-2002, Issue , 2002, Pages 544-547

Effect of microwave radiation on boron activation

(6) Thompson, Keith a Booske, John H a Cooper, Reid F a Gianchandani, Yogesh B a Downey, Daniel F b Arevalo, Edwin A b

a UNIVERSITY OF WISCONSIN MADISON (United States)

b VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES (United States)

Author keywords

Boron; Chemical processes; Implants; Impurities; Kinetic theory; Lighting; Rapid thermal annealing; Rapid thermal processing; Silicon; Ultraviolet sources

Indexed keywords

CHEMICAL ACTIVATION; DENTAL PROSTHESES; DIFFUSION; FLUORINE; HEAT TREATMENT; IMPURITIES; ION IMPLANTATION; KINETIC THEORY; LIGHTING; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SILICON;

ACTIVATION KINETICS; CHEMICAL PROCESS; ENHANCED DIFFUSION; LOW ENERGY IMPLANTS; MICROWAVE ANNEALING; OPTICAL ILLUMINATION; REACTIVE IMPURITIES; ULTRAVIOLET SOURCES;

BORON;

EID: 59649095600 PISSN: None EISSN: None Source Type: Conference Proceeding
DOI: 10.1109/IIT.2002.1258062 Document Type: Conference Paper

Times cited : (5)

References (7)

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2
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