Structural study of the initial growth of nanocrystalline CdS thin films in a chemical bath

Thin Solid Films

Volumn 517, Issue 8, 2009, Pages 2586-2589

  Kozhevnikova, Natalia S ^a   Rempel, Andrey A ^a   Hergert, Frank ^b   Magerl, Andreas ^b  

^a INSTITUTE OF SOLID STATE CHEMISTRY   (Russian Federation)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Cadmium sulfide (CdS); Chemical bath deposition; Grazing incidence X ray diffraction; Nanocrystalline films

Indexed keywords

CADMIUM COMPOUNDS; CHEMICAL VAPOR DEPOSITION; DATA STORAGE EQUIPMENT; DIFFRACTION; NANOCRYSTALLINE ALLOYS; NANOCRYSTALLINE MATERIALS; NANOCRYSTALLINE SILICON; SEMICONDUCTING CADMIUM COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS; SULFIDE MINERALS; THIN FILMS; X RAY ANALYSIS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC SULFIDE;

AQUEOUS SOLUTIONS; BATH COMPOSITIONS; CADMIUM HYDROXIDES; CADMIUM SULFIDE (CDS); CDS; CDS THIN FILMS; CHEMICAL BATH DEPOSITION; CHEMICAL BATHS; DEPOSITION TIME; GRAZING INCIDENCE X-RAY DIFFRACTION; IONIC EQUILIBRIUM; KINETIC STUDIES; NANO-CRYSTALLINE; NANO-CRYSTALLINE PARTICLES; NANOCRYSTALLINE FILMS; NON-EQUILIBRIUM STATE; OPTICAL APPLICATIONS; PARTICLE CHARACTERISTICS; RELATIVE FRACTIONS; SILICON SUBSTRATES; STRUCTURAL STUDIES; THERMODYNAMICAL ANALYSIS; THICKNESS OF THE FILMS; WURTZITE STRUCTURES;

CADMIUM;

EID: 59349118703     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.10.014     Document Type: Article

References (39)

1. Vossmeyer T., Katsikas L., Giersig M., Popovic I.G., Diesner K., Chemseddine A., Eychmueller A., and Weller H. J. Phys. Chem. 98 (1994) 7665
2. Kumazawa S., Shibutani S., Nishio T., Aramoto T., Higuchi H., Arita T., Hanafusa A., Omura K., Murozono M., and Takakura H. Sol. Energy Mater. Sol. Cells 49 (1997) 205
3. Hashimoto Y., Kohara N., Negami T., Nishitani N., and Wada T. Sol. Energy Mater. Sol. Cells 50 (1998) 71
4. Maruyama T., and Kitamura R. Sol. Energy Mater. Sol. Cells 69 (2001) 61
5. Tsuji M., Aramoto T., Ohyama H., Hibino T., and Omura K. J. Cryst. Growth 214/215 (2000) 1142
6. Rau U., and Schock H.W. Appl. Phys. A 69 (1999) 131
7. Bär M., Weinhardt L., Heske C., Muffler H.-J., Umbach E., Lux-Steiner M.Ch., Niesen Th.P., Karg F., and Fischer Ch.-H. Sol. Energy Mater. Sol. Cells 90 (2006) 3151
8. Duan X., Niu C., Sahi V., Chen J., Parce J.W., Empedocles S., and Goldman J.L. Nature 425 (2003) 274
9. Klimov V.I., Mikhailovsky A.A., Xu S., Malko A., Hollingsworth J.A., Leatherdale C.A., Eisler H.-J., and Bawendi M.G. Science 290 (2000) 314
10. Bruchez Jr. M., Moronne M., Gin P., Weiss S., and Alivisatos A.P. Science 281 (1998) 2013
11. Parak W.J., Gerion D., Pellegrino T., Zanchet D., Micheel C., Williams S.C., Boudreau R., Le Gros M.A., Larabell C.A., and Alivisatos A.P. Nanotechnology 14 (2003) R15
12. Howie J.A.B., Rowles G.K., and Hawkins P. Meas. Sci. Technol. 2 (1991) 1070
13. Fainer N.I., Kosinova M.L., Rumyantsev Y.M., Salman E.G., and Kuznetsov F.A. Thin Solid Films 280 (1996) 16
14. Pal U., Silva-Gonzalez R., Martinez-Montes G., Gracia-Jimenez M., Vidal M.A., and Torres Sh. Thin Solid Films 305 (1997) 345
15. Saloniemi H. Electrodeposition of PbS, PbSe and PbTe Thin Films. Espoo. Technical Research Centre of Finland vol. 423 (2000), VTT Publications 82 pp.
16. Ceserano J.I., Burch E., Lopez G.P., and Xu X. Thin Solid Films 305 (1997) 95
17. Thangaraju B., and Kaliannan P. Cryst. Res. Technol. 35 (2000) 71
18. Baykul M.C., and Balcioglu A. Microelectron. Eng. 51-52 (2000) 703
19. Katsikas L., Eychmüller A., Giersig M., and Weller H. Chem. Phys. Lett. 172 (1990) 201
20. O P., Brien, and McAleese J. J. Mater. Chem. 8 (1998) 2309
21. Zhang J., Sun L., Liao S., and Yan C. Solid State Commun. 124 (2002) 45
22. Anderson M.A., Gorer S., and Penner R.M. J. Phys. Chem. B 101 (1997) 5895
23. Moutinho H.R., Albin D., Yan Y., Dhere R.G., Li X., Perkins C., Jiang C.-S., To B., and Al-Jassim M.M. Thin Solid Films 436 (2003) 175
24. Kozhevnikova N.S., Kurlov A.S., Uritskaya A.A., and Rempel A.A. J. Struct. Chem. 45 (2004) S154 (Supplement)
25. Preobrazhenskaya T.Yu., and Yusupov R.A. Russ. J. Appl. Chem. 48 (1974) 724 (in Russian)
26. Boyle D.S., O'Brien P., Otway D.J., and Robbe O. J. Mater. Chem. 9 (1999) 725
27. Froment M., and Lincot D. Electrochim. Acta 40 (1995) 1293
28. Kitaev G.A., Uritskaya A.A., Yatlova L.E., and Mirolubov V.R. Russ. J. Appl. Chem. 67 (1994) 1612 (in Russian)
29. Yatlova L.E., and Kitaev G.A. Izv. Vyssh. Uchebn. Zaved., Khim. Khim. Tekhnol. 12 (1969) 709 (in Russian)
30. Kitaev G.A., and Uritskaya A.A. Russ. J. Appl. Chem. 72 (1999) 569
31. Kitaev G.A., Makurin Yu.N., and Dvoinin V.I. Russ. J. Phys. Chem. 50 (1976) 3074 (in Russian)
32. Kitaev G.A., Uritskaya A.A., and Mokrushin S.G. Russ. J. Phys. Chem. 39 (1965) 2065 (in Russian)
33. Chapman A.J., Lane D.W., Rogers K.D., and Özsan M.E. Thin Solid Films 403-404 (2002) 522
34. Yan Y., Albin D., and Al-Jassim M.M. Appl. Phys. Lett. 72 (2001) 171
35. O'Brien P., and Saeed T.J. J. Cryst. Growth 158 (1996) 497
36. Ortega-Borges R., and Lincot D. J. Electrochem. Soc. 140 (1993) 3464
37. Boyle D.S., Bayer A., Heinrich M.R., Robbe O., and O'Brien P. Thin Solid Films 361-362 (2000) 150
38. Rempel A.A., Kozhevnikova N.S., Van den Berghe S., Van Renterghem W., and Leenaers A.J.G. Phys. Status Solidi, B Basic Res. 242 (2005) R61
39. Bayer A., Boyle D.S., and O'Brien P. J. Mater. Chem. 12 (2002) 2940