Growth of PbS and CdS thin films by low-pressure chemical vapour deposition using dithiocarbamates

Thin Solid Films

Volumn 280, Issue 1-2, 1996, Pages 16-19

  Fainer, N I ^a   Kosinova, M L ^a   Rumyantsev, Yu M ^a   Salman, E G ^a   Kuznetsov, F A ^a  

^a NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

Author keywords

Cadmium sulphide; Plasma processing and deposition; Sulphides; X ray diffraction

Indexed keywords

ACTIVATION ENERGY; CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; FUSED SILICA; LOW TEMPERATURE OPERATIONS; PLASMA APPLICATIONS; POLYCRYSTALLINE MATERIALS; SAPPHIRE; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTING SILICON; SULFUR COMPOUNDS; THIN FILMS;

CADMIUM SULPHIDES; DITHIOCARBAMATES; LEAD SULPHIDES; RADIO FREQUENCY PLASMA ACTIVATION; REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

FILM GROWTH;

EID: 0030190773     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08188-7     Document Type: Article

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