Silver islands formed after air annealing of amorphous Ag-Cu-Mn-O sputtered films

Journal of Crystal Growth

Volumn 311, Issue 2, 2009, Pages 349-354

  Pierson, J F ^a   Baija, M ^a   Horwat, D ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

A1. Structure; A1. Thermal stability; A3. Physical vapour deposition processes; B1. Oxides

Indexed keywords

AMORPHOUS FILMS; ANNEALING; COPPER; ELECTRODEPOSITION; ELECTRON MICROSCOPY; EXPLOSIVE ACTUATED DEVICES; HYDROCHLORIC ACID; MANGANESE; MANGANESE COMPOUNDS; SCANNING; SCANNING ELECTRON MICROSCOPY; SILVER ALLOYS; THERMODYNAMIC STABILITY; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS;

A1. STRUCTURE; A1. THERMAL STABILITY; A3. PHYSICAL VAPOUR DEPOSITION PROCESSES; AIR ANNEALING; AS-DEPOSITED FILMS; B1. OXIDES; CHEMICAL ETCHING; CO-SPUTTERING; GLASS SUBSTRATES; OXIDE SURFACES; REFLECTANCE MEASUREMENTS; SILVER ISLANDS; SPUTTERED FILMS; UV-VISIBLE; X RAY DIFFRACTION (XRD); X-RAY AMORPHOUS; X-RAY ENERGY DISPERSIVE SPECTROSCOPY (XEDS);

SILVER;

EID: 58549100669     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2008.10.028     Document Type: Article

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