a-C:H films deposited in the plasma of barrier and surface discharges at atmospheric pressure

Surface and Coatings Technology

Volumn 96, Issue 1, 1997, Pages 123-128

  Bugaev, S P ^a   Korotaev, A D ^b   Oskomov, K V ^a   Sochugov, N S ^a  

^a INSTITUTE OF HIGH CURRENT ELECTRONICS   (Russian Federation)

^b TOMSK STATE UNIVERSITY   (Russian Federation)

Author keywords

Diamond like films; Surface discharge; Vacuum plasma deposition

Indexed keywords

ACETYLENE; CARBON; CHEMICAL VAPOR DEPOSITION; COMPOSITION; HYDROGEN; METHANE; PHASE COMPOSITION; PHYSICAL PROPERTIES; PLASMAS; SYNTHESIS (CHEMICAL); VACUUM APPLICATIONS;

BARRIER DISCHARGE; DIAMOND LIKE FILM; SURFACE DISCHARGE; VACUUM PLASMA DEPOSITION;

COATINGS;

EID: 0031551614     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00000-5     Document Type: Article

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