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Volumn , Issue , 2006, Pages 105-111

High-temperature spin-on adhesives for temporary wafer bonding

Author keywords

Spin on adhesives; Temporary adhesives; Temporary wafer bonding; Wafer thinning

Indexed keywords

FLEXIBLE SUBSTRATE; HIGH TEMPERATURE; HIGH TEMPERATURE STABILITY; OPERATING TEMPERATURE; PERFORMANCE REQUIREMENTS; PROCESSING WINDOWS; SPIN-ON; WAFER THINNING;

EID: 58449083141     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (5)

References (5)
  • 2
    • 84877977200 scopus 로고    scopus 로고
    • High temperature resistant adhesive for wafer thinning and backside processing
    • J. Moore, A. Smith, D. Nguyen. S. Kulkami, "High Temperature Resistant Adhesive for Wafer Thinning and Backside Processing." MANTECH 2004, 8.10.
    • (2004) MANTECH , vol.8 , pp. 10
    • Moore, J.1    Smith, A.2    Kulkami, D.Nguyen.S.3
  • 3
    • 34250889635 scopus 로고    scopus 로고
    • Advances in processing of compound semiconductor substrates
    • C. Brubaker, M. Wimp linger. A. Malzer, P. Lindner, "Advances in Processing of Compound Semiconductor Substrates, " MANTECH 2005. p. 261.
    • (2005) MANTECH , pp. 261
    • Brubaker, C.1    Malzer, M.W.Linger.A.2    Lindner, P.3
  • 4
    • 34250794739 scopus 로고    scopus 로고
    • Reversible wafer bonding: Challenges in ramping up 150mm GaAs wafer production to meet growing demand
    • S. Combe. J. Cullen, M. O'Keefe. "Reversible Wafer Bonding: Challenges in Ramping up 150mm GaAs Wafer Production to Meet Growing Demand, " MANTECH 2006. p. 193.
    • (2006) MANTECH , pp. 193
    • Cullen, S.1    Combe, J.2    O'Keefe, M.3
  • 5
    • 23944470605 scopus 로고    scopus 로고
    • An evaluation process of polymeric adhesive wafer bonding for vertical system integration
    • Y. Kwon, J. Seok. "An evaluation process of polymeric adhesive wafer bonding for vertical system integration, " Japanese Journal of Applied Physics, Part 1, vol. 44. no. 6A. 2005. pp. 3893-3902.
    • (2005) Japanese Journal of Applied Physics, Part 1 , vol.44 , Issue.6 A , pp. 3893-3902
    • Kwon, Y.1    Seok, J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.