Interfacial reactions and resistive switching behaviors of metal/NiO/metal structures

Applied Physics Letters

Volumn 94, Issue 2, 2009, Pages

  Phark, S H ^a   Jung, R ^b   Chang, Y J ^a   Noh, T W ^a   Kim, D W ^c  

^a Seoul National University   (South Korea)

^b Kwangwoon University   (South Korea)

^c Ewha Womans University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EMISSION SPECTROSCOPY; OXYGEN; PLATINUM; SWITCHING SYSTEMS; ULTRATHIN FILMS;

CHEMICAL STATE CHANGES; FILAMENT FORMATIONS; INTERFACIAL CHEMICALS; INTERFACIAL REACTIONS; NIO FILMS; POSITIVE BIASES; RESISTIVE SWITCHING; RUPTURE PROCESSES;

SILVER;

EID: 58349122337     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3072800     Document Type: Article

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