AFM fabrication and characterization of nanoscale Al 2 O 3 patterns

Journal of Materials Science: Materials in Electronics

Volumn 20, Issue 2, 2009, Pages 177-180

  Jiao, Zheng ^a   Zhang, Haijiao ^a   Wu, Minghong ^a   Guo, Huijiao ^a   Wang, Jia ^a   Zhao, Bing ^a   Ding, Guoji ^a  

^a SHANGHAI UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED VOLTAGES; ATOMIC FORCES; DOT ARRAYS; NANOSCALE; OXIDATION MECHANISMS; SCANNING SPEEDS; SI SUBSTRATES; SURFACE LAYERS;

ALUMINUM; ATOMIC FORCE MICROSCOPY; FABRICATION; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; SILICON COMPOUNDS;

ANODIC OXIDATION;

EID: 58249088253     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-008-9678-1     Document Type: Article

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