Nanolithography by non-contact AFM-induced local oxidation: Fabrication of tunnelling barriers suitable for single-electron devices

Semiconductor Science and Technology

Volumn 13, Issue 8 SUPPL. A, 1998, Pages

  Irmer, B ^a   Kehrle, M ^a   Lorenz, H ^a   Kotthaus, J P ^a  

^a UNIVERSITY OF MUNICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002567608     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/13/8A/024     Document Type: Article

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