SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 203, Issue 9, 2009, Pages 1288-1291

Magnetron sputtering deposition Ti-B-C-N films by Ti/B4C compound target

(4) Tang, Guangze a Ma, Xinxin a Sun, Mingren a Xu, Shuyan b

a HARBIN INSTITUTE OF TECHNOLOGY (China)

b NORTHEAST FORESTRY UNIVERSITY (China)

Author keywords

Hardness; Magnetron sputtering deposition; Scratch test; Ti B C N films; X ray

Indexed keywords

HARDNESS; MAGNETRON SPUTTERING; MAGNETRONS; METALLIC FILMS; PHOTOELECTRON SPECTROSCOPY; TARGETS; X RAY PHOTOELECTRON SPECTROSCOPY;

COIL CURRENTS; DEPOSITION PARAMETERS; FILM COMPOSITIONS; GAS RATIOS; MAGNETIC COILS; MAGNETRON SPUTTERING DEPOSITION; MAXIMUM VALUES; NANO INDENTATIONS; PHOTOELECTRON SPECTRUMS; SCRATCH RESISTANCES; SCRATCH TEST; TI-B-C-N FILMS; X-RAY; X-RAY DIFFRACTIONS;

X RAY DIFFRACTION ANALYSIS;

EID: 58149507966 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2008.10.038 Document Type: Article

Times cited : (12)

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