Impact of air exposure on the chemical and electronic structure of ZnO: Zn3N2 thin films

Applied Physics Letters

Volumn 94, Issue 1, 2009, Pages

  Bar M ^a   Ahn, K S ^b   Shet, S ^b   Yan, Y ^b   Weinhardt, L ^a   Fuchs, O ^c   Blum, M ^c   Pookpanratana, S ^a   George, K ^a   Yang, W ^d   Denlinger, J D ^d   Al Jassim, M ^b   Heske, C ^a  

^a UNIVERSITY OF NEVADA   (United States)

^b NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^c UNIVERSITY OF WÜRZBURG   (Germany)

^d LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC HUMIDITY; ATOMIC SPECTROSCOPY; DEGRADATION; ELECTRONIC STRUCTURE; EMISSION SPECTROSCOPY; MOLECULAR SPECTROSCOPY; PHOTODEGRADATION; SEMICONDUCTING ZINC COMPOUNDS; THIN FILMS; ZINC; ZINC OXIDE;

AIR EXPOSURES; AMBIENT AIRS; DEGRADATION MECHANISMS; ELECTRONIC SURFACES; EXPOSURE TIMES; IN VACUUMS; N CONTENTS; N FILMS;

SURFACE STRUCTURE;

EID: 58149504131     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3056638     Document Type: Article

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